Silklase: State-of-the-art CO2 laser technology in a single unit

With over 30 years of experience in European laser technology, Silklase offers ease of use, safety and exceptional results.

Multidisciplinary team without the need for consumables

Fantastic ablation with minimal thermal damage

About Silklase

The Silklase system is a CO2 laser that guarantees absolute precision in each treatment, controlling the penetration and thermal effect, ensuring optimal postoperative recovery.

With a wide pulse range below epidermal TRT, it offers maximum subtlety and comfort for patients. Its unique scanner allows multiple functions, from homogeneous ablation to specific scar treatments, all with minimal thermal damage.

Silklase is compatible with all phototypes and adapts to any time of the year, allowing for a wide variety of applications, from dyschromia to acne scars.

In addition, its multidisciplinary design and the absence of consumables reduce costs, always keeping treatments at the forefront. With personalized support, Silklase is the ideal choice for those seeking excellence in procedures and results.

Silklase: The cornerstone of your practice

Dermatology

Actinic cheilitis

Syringomas

Fibromas

Nevus

Milliums

Xanthelasmas

Sebaceous cyst

Epithelioma

Benign non-vascular tumors

Infectious and inflammatory lesions

Dermatoesthetics

Fractional resurfacing (ablative and non-ablative)

Laser peeling

Eyelid retraction (non-surgical blepharoplasty)

Keloids

Acne scars

Stretch marks

Wrinkles

Enlarged pores

General Surgery

Tumors

Wound debridement

Biopsies

Advantages of Silklase

Absolute Accuracy

Total control of penetration, thermal and postoperative effect, guaranteeing optimal results and a satisfactory patient experience.

Wide Pulse Range

Works below the epidermal TRT, providing maximum subtlety and comfort for all skin types and treatments.

Total Multidisciplinarity

This device is suitable for all phototypes and can be used all year round, offering both ablative and non-ablative treatments.